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Project Details


Read More ... Development of the extreme ultaviolet interference lithography technologies for a fabrication of nanosized plasmonic structures and investigations of the structures as core elements of terahertz radiation sources
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Funding Agency: Federal Ministry of Education and Research
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Participating Organizations
Partner 1: V.Ye. Lashkaryov Institute of Semiconductor Physics
Partner 2: RWTH Aachen University
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Start: 2017
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Project Field: Exact and Natural Sciences
Project Type: Research Project
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